intel metal gate
12High-kandmetalgatetechnologyproposedbyIntel(productionyear:2007)[26].Sourcepublication.Fig.1.1ImagesofdifferentsemiconductorNWs.(a) ...,2007年12月24日—Intel和IBM兩家公司在2007年1月相繼發表了high-k/metalgate的實用化時程,兩家公司自2007下半年到20...
Integrating high-k metal gates: gate-first or gate
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由TYHoffmann著作·被引用33次—Intel'stechnologyroadmapillustratinghowmigratingfromPoly/SiONtometalgate/high-k(MG/HK)enabledtheresumptionofelectricalToxscaling,while ...
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