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由LWu著作·2013—Thechapterfirstexplainsthedetailsofdevicesfabricationprocessandthendescribestheanalysistechniqueusedinthisproject,including ...,ElectrodeandDielectricWhenthegateispulsed,currentflowsbetweenthesourceanddrain.Intel'sHigh-K/MetalGatet...
Advanced CMOS technologies (high‑kmetal gate stacks) for ...
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由LWu著作·2013—Thechapterfirstexplainsthedetailsofdevicesfabricationprocessandthendescribestheanalysistechniqueusedinthisproject,including ...
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