proximity exposure
proximity exposure

-PostExposureBake(PEB).3.Developing.-develop.-AfterDevelopingInspection...Method:Oven,ContactHot-plate,ProximityHot-plate.ContactHot-plate.,由TYChang著作·2013·被引用1次—Thisstudyaimstoproduceahighfillfactormicrolenswithaspecifictiltangleandusesit...

Examining proximity exposure in a social network as ...

由GEKhalil著作·2021·被引用8次—Proximityexposurewascalculatedastheproportionofanindividual'snetworkpeerswhosmoked,consideringtheirdistancefromtheindividual.

** 本站引用參考文章部分資訊,基於少量部分引用原則,為了避免造成過多外部連結,保留參考來源資訊而不直接連結,也請見諒 **

黃光微影製程技術

- Post Exposure Bake (PEB). 3. Developing. - develop. - After Developing Inspection ... Method : Oven, Contact Hot-plate, Proximity Hot-plate. Contact Hot-plate.

Using proximity exposure to produce asymmetrical lens for ...

由 TY Chang 著作 · 2013 · 被引用 1 次 — This study aims to produce a high fill factor microlens with a specific tilt angle and uses it to enhancing the brightness of film with a light-emitting ...

High

由 SNS Nonogaki 著作 · 1993 · 被引用 4 次 — The method utilizes a mask containing an equal-width line-and-space pattern of the half-wavelength phase shifter. A film of photoresist formed on a substrate is ...

Examining proximity exposure in a social network as ...

由 GE Khalil 著作 · 2021 · 被引用 8 次 — Proximity exposure was calculated as the proportion of an individual's network peers who smoked, considering their distance from the individual.

Resist-Wiki: Exposure

Proximity exposure is similar to contact exposure, but the mask is here positioned above the photo resist in a distance of approximately 10 – 50 m m. Damages of ...

Photolithography

In proximity exposure there is no direct contact of the photomask and the resist. Thus only a shadow image is projected onto the wafer which results in a much ...

Lithography Exposure Modes

2020年5月4日 — Exposure Mode: Proximity The alternate to contact exposure is to use proximity exposure. Here the mask and wafer never touch and are held ...


proximityexposure

-PostExposureBake(PEB).3.Developing.-develop.-AfterDevelopingInspection...Method:Oven,ContactHot-plate,ProximityHot-plate.ContactHot-plate.,由TYChang著作·2013·被引用1次—Thisstudyaimstoproduceahighfillfactormicrolenswithaspecifictiltangleandusesittoenhancingthebrightnessoffilmwithalight-emitting ...,由SNSNonogaki著作·1993·被引用4次—Themethodutilizesamaskcontaininganequal-widthline-and-spacepatt...