deep trench isolation process
由MForsberg著作·2004·被引用4次—Ashallowanddeeptrenchisolationprocessmoduleforhighperformancerfbipolarcomplementarymetal-oxide-semiconductor.(BiCMOS)ispresentedindetail.,由RDRung著作·1982·被引用139次—Adeep(5-6microns)trenchisolationprocesswhichper...
Method for Forming Deep Trench Isolation Structure for CMOS ...
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2023年12月16日—Themethodbeginsbyformingatrenchinasemiconductorsubstrate,extendingfromonesidetotheother.Thetrenchhasanopeningononeside, ...
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