Immersion lithography

Immersion lithography is a technique used in semiconductor manufacturing to enhance the resolution and accuracy of the lithographic process.

2019年6月10日 — 12 吋晶圓主要光刻機為ArF immersion 機台，可涵蓋45nm 一路往下到7nm 節點的使用範圍，雷射光波長最小微縮到193nm；針對7nm 節點以下製程，EUV（Extreme ...

2023年8月2日 — The risk of shrink. In the early 2000s, the chip industry had been working on a transition from lithography with argon fluoride (ArF) light ...

ArF IMMERSION LIGHT SOURCES. ArFi: Extending the Life of the 193 nm Wavelength. ArF (argon fluoride) immersion light sources feature a 193 nm wavelength ...

Leading the pack; Cutting edge lithography; Low LWR; Low defectivity; Low MEEF (mask error enhancement factor). JSR ArF Immersion Photoresist with Dual HM.

2015年6月1日 — Most ArF immersion light sources have a target bandwidth of 300 fm E95 with a typical variation of 10–20%. This study used a bandwidth variation ...

由 J Song 著作 · 2022 · 被引用 2 次 — The ArF immersion system has a resolution of 42 nm critical dimension based on the line and space pattern, and can achieve a resolution of up to ...

2023年12月6日 — The NSR-S636E ArF immersion scanner utilizes an enhanced iAS*1 that performs sophisticated wafer multipoint measurement before exposure. This ...

ArF Immersion Lithography Supports High-Volume 14-nm Chip Manufacturing · Improved CD control through high bandwidth stability · Gas management functions for ...

由 JH Chen 著作 · 2005 · 被引用 31 次 — ArF immersion lithography is essential to extend optical lithography. In this study, we characterized the immersion process on production wafers.