![hkmg process flow](https://host.easylife.tw/pics/201212/Czech22_IronGate/IMG_2727.jpg)
本发明涉及简化的先栅极HKMG制造流程,当依据先栅极HKMG方法形成场效应晶体管时,在硅化步骤以前必须移除形成于栅极电极的顶部上的覆盖层,从而导致在晶体管的栅极电极 ...,GrapheneaFoundryqualifiesaHKMGprocessflowwithanEOTdownto5nm,anindustryfirst.Following...
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- high k metal gate製程
- high k metal gate原理
- metal gate
- hk metal gate
- MOSFET structure
- 28nm process flow
- Semiconductor gate
- metal gate好處
- 改善短通道效應
- high k metal gate製程
- CMOS polysilicon
- Gate-last process
- hk metal gate
- metal work function table
- metal gate h1z1
- high k metal gate work function
- high k材料有哪些
- metal gate台積電
- high k metal gate製程
- metal gate poly gate
- stage gate process
- Why metal gate
- metal gate
- metal work function
- metal gate process flow
由CQin著作·2013·被引用1次—Inthispaper,aprocesschallengeofintegratingDualStressLiner.(DSL)(1)-(2)intogate-lastHigh-k/MetalGate(HKMG)flowis.
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