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ElectrodeandDielectricWhenthegateispulsed,currentflowsbetweenthesourceanddrain.Intel'sHigh-K/MetalGatetechnologyenabledelementsonachipto ...,由JRobertson著作·2015·被引用734次—Wereviewthatprogressinthisarticle,withanemphasisonthekeydevelopmentsint...
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由EErben著作·2018·被引用8次—ThemetalgateforNMOStransistorsrequiresaworkfunctionclosetotheconductionbandofSi(∼4.1eV)andthePMOStransistorneedsametalgatewitha ...
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