high k metal gate process
ElectrodeandDielectricWhenthegateispulsed,currentflowsbetweenthesourceanddrain.Intel'sHigh-K/MetalGatetechnologyenabledelementsonachipto ...,由JRobertson著作·2015·被引用734次—Wereviewthatprogressinthisarticle,withanemphasisonthekeydevelopmentsint...
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Intelmadeasignificantbreakthroughinthe45nmprocessbyusingahigh-k(Hi-k)materialcalledhafniumtoreplacethetransistor'ssilicondioxidegate ...
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